1. Akụkụ ziri ezi
Flatness: flatness nke elu nke isi kwesịrị iru a nnọọ elu ọkọlọtọ, na flatness njehie ekwesịghị gafere ± 0.5μm na ọ bụla 100mm × 100mm mpaghara; Maka ụgbọ elu ala dum, a na-achịkwa njehie flatness n'ime ± 1μm. Nke a na-eme ka isi ihe ndị dị na semiconductor akụrụngwa, dị ka isi ikpughe nke akụrụngwa lithography na tebụl nyocha nke akụrụngwa nchọpụta mgbawa, nwere ike ịwụnye ma rụọ ọrụ n'ụgbọ elu dị elu, hụ na izi ezi nke ụzọ anya na njikọ sekit nke akụrụngwa, wee zere mgbanwe mgbanwe nke akụrụngwa kpatara site na ụgbọ elu na-enweghị isi nke ntọala, nke na-emetụta mgbawa na nchọpụta semiconductor.
Ịkwụ ọtọ: Ịkwụ ọtọ nke akụkụ ọ bụla nke isi dị oké mkpa. N'akụkụ nke ogologo, njehie nkwụ ọtọ agaghị agafe ± 1μm kwa 1m; A na-achịkwa njehie diagonal kwụ ọtọ n'ime ± 1.5μm. Na-ewere igwe lithography dị elu dị ka ihe atụ, mgbe tebụl na-aga n'akụkụ okporo ụzọ nduzi nke isi, nkwụsi ike nke nsọtụ nke isi na-emetụta kpọmkwem trajectory ziri ezi nke tebụl. Ọ bụrụ na nkwụ ọtọ erughi ọkọlọtọ, ụkpụrụ lithography ga-agbagọ ma mebie, na-ebute mbelata nke nrụpụta mgbawa.
Parallelism: Njehie myirịta nke elu na ala nke isi kwesịrị ịchịkwa n'ime ± 1μm. Ezigbo ihe yiri ya nwere ike hụ na nkwụsi ike nke etiti n'ozuzu ike ndọda mgbe echichi nke akụrụngwa, na ike nke akụkụ ọ bụla bụ otu. Na semiconductor wafer na-emepụta ngwá ọrụ, ọ bụrụ na elu na elu elu nke isi adịghị ejikọta, wafer ahụ ga-adaba n'oge nhazi, na-emetụta usoro nhazi dị ka etching na mkpuchi, ma si otú ahụ na-emetụta arụmọrụ mgbawa.
Nke abụọ, njirimara ihe onwunwe
Isi ike: Isi ike nke ihe ndabere granite kwesịrị iru HS70 hardness ma ọ bụ karịa. The elu ekweghị ekwe nwere ike n'ụzọ dị irè iguzogide iyi kpatara ugboro ugboro ije na esemokwu nke components n'oge ọrụ nke akụrụngwa, n'ịhụ na isi nwere ike ịnọgide na-enwe a elu nkenke size mgbe ogologo oge eji. N'ime ngwa nkwakọ ngwaahịa mgbawa, ogwe aka robot na-ejidekarị ma tinye mgbawa na ntọala, na ike siri ike nke ntọala ahụ nwere ike hụ na elu adịghị mfe imepụta ncha ma jikwaa izi ezi nke mmegharị ogwe aka robot.
Njupụta: Njupụta ihe kwesịrị ịdị n'etiti 2.6-3.1 g/cm³. Njupụta kwesịrị ekwesị na-eme ka ntọala ahụ nwee nkwụsi ike dị mma, nke nwere ike hụ na nkwụsi ike zuru ezu iji kwado ngwá ọrụ ahụ, ọ gaghị ewetakwa ihe isi ike na ntinye na njem nke ngwá ọrụ n'ihi oke ibu. N'ime nnukwu ihe nyocha nke semiconductor, njupụta ntọala kwụsiri ike na-enyere aka belata nnyefe vibration n'oge arụ ọrụ akụrụngwa ma kwalite izi ezi nchọpụta.
Nkwụsi ike nke okpomọkụ: ọnụọgụ mgbasawanye ahịrị erughị 5 × 10⁻⁶/℃. Ngwá ọrụ semiconductor na-enwe mmetụta nke ukwuu maka mgbanwe okpomọkụ, na nkwụsi ike nke okpomọkụ nke isi na-ejikọta ya na izi ezi nke ngwa ahụ. N'oge usoro lithography, mgbanwe okpomọkụ nwere ike ime ka mgbasawanye ma ọ bụ nkwụsị nke isi, na-ebute mgbanwe na nha nke ụkpụrụ ngosi. Ntọala granite nwere ọnụọgụ mgbasawanye ahịrị dị ala nwere ike ijikwa mgbanwe nha n'obere obere mgbe okpomọkụ akụrụngwa na-agbanwe (n'ozuzu 20-30 Celsius C) iji hụ na lithography ziri ezi.
Nke atọ, ogo elu
Roughness: elu roughness Ra uru na ntọala anaghị agafe 0.05μm. Igwe dị nro dị nro nwere ike ibelata mgbasa ozi nke uzuzu na adịghị ọcha ma belata mmetụta na ịdị ọcha nke ebe nrụpụta mgbawa semiconductor. Na ogbako na-enweghị uzuzu nke n'ichepụta mgbawa, obere ihe nwere ike iduga ntụpọ dị ka obere mgbawa nke mgbawa, na elu dị nro nke isi na-enyere aka ịnọgide na-enwe ebe dị ọcha nke ụlọ ọrụ ahụ ma melite mgbawa.
Nrụrụ microscopic: A naghị ekwe ka elu nke ntọala ahụ nwee ihe mgbawa a na-ahụ anya, oghere ájá, pores na ntụpọ ndị ọzọ. N'ọkwa ihe nlere anya, ọnụọgụ ntụpọ nwere dayameta karịrị 1μm kwa centimita square agaghị agafe 3 site na microscopy eletrọn. Nrụrụ ndị a ga-emetụta ike nhazi na elu elu nke isi, wee metụta nkwụsi ike na izi ezi nke akụrụngwa.
Nke anọ, nkwụsi ike na nkwụsi ike
Nkwụsi ike na-agbanwe agbanwe: Na gburugburu ịma jijiji nke simulated emepụtara site na arụ ọrụ nke akụrụngwa semiconductor (ugboro mkpọtụ 10-1000Hz, njupụta 0.01-0.1mm), ntugharị mkpọtụ nke isi ihe na-arị elu na ntọala kwesịrị ịchịkwa n'ime ± 0.05μm. Inweta akụrụngwa nnwale nke semiconductor dị ka ọmụmaatụ, ọ bụrụ na ebutere ịma jijiji nke ngwaọrụ ahụ na ịma jijiji gburugburu ya na ntọala mgbe a na-arụ ọrụ, enwere ike igbochi izi ezi nke mgbama ule. Ezi nkwụsi ike ike nwere ike hụ na nsonaazụ ule a pụrụ ịdabere na ya.
Seismic eguzogide: The base ga-enwe magburu onwe seismic arụmọrụ, na ike ngwa ngwa attenuate na vibration ike mgbe ọ na-doro na mberede mpụga vibration (dị ka seismic ife simulation vibration), na hụ na ikwu ọnọdụ nke isi components nke akụrụngwa na-agbanwe n'ime ± 0.1μm. N'ime ụlọ ọrụ semiconductor na mpaghara ala ọma jijiji, ntọala ndị na-eguzogide ala ọma jijiji nwere ike ichebe akụrụngwa semiconductor dị oke ọnụ nke ọma, na-ebelata ihe ize ndụ nke mmebi akụrụngwa na mmebi mmepụta n'ihi ịma jijiji.
5. Chemical kwụsie ike
Nguzogide corrosion: The granite base kwesịrị iguzogide corrosion nke ndị na-ahụ maka kemịkalụ na-emekarị na usoro mmepụta semiconductor, dị ka hydrofluoric acid, aqua regia, wdg Mgbe ịtinye na ngwọta hydrofluoric acid na ọnụ ọgụgụ dị ukwuu nke 40% maka awa 24, ọnụ ọgụgụ ọnwụ nke elu agaghị agafe 0.01%; Sook na aqua regia (olu nke hydrochloric acid na nitric acid 3:1) ruo awa 12, na enweghị ihe doro anya nke corrosion dị n'elu. Usoro mmepụta nke semiconductor na-agụnye usoro dị iche iche nke etching na ihicha kemịkalụ, na ezigbo nguzogide corrosion nke isi nwere ike hụ na ogologo oge eji eme ihe na gburugburu ebe obibi kemịkalụ adịghị emebi emebi, a na-echekwa izi ezi na nhazi nhazi.
Mgbochi mmetọ: The isi ihe nwere nnọọ ala absorption nke nkịtị mmetọ na semiconductor n'ichepụta gburugburu ebe obibi, dị ka organic gas, metal ion, wdg Mgbe etinye na gburugburu ebe obibi nwere 10 PPM nke organic gas (eg, benzene, toluene) na 1ppm nke metal ion (eg, ọla kọpa ion, ígwè ion) maka 72 awa na-arụ ọrụ nke pollutant n'ihi mgbanwe nke elu. eleghi anya. Nke a na-egbochi ihe ndị na-emerụ emerụ ịkwaga site n'elu ala na mpaghara mmepụta mgbawa ma na-emetụta àgwà mgbawa.
Oge nzipu: Mar-28-2025